Fibics Pattern
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FIB
  • FIB for Semiconductor Applications
  • Device Modification (Microsurgery)
  • Probe Pad & Window Creation
  • Parallel Lapping
  • TEM Specimen Preparation
    • TEM
  • TEM for Semiconductor Applications
    • SIMS
  • SIMS for Semiconductor Applications
  • Application Examples
  • Additional Analytical Services
    • Additional Analytical Services
    As well as our own Micrion 2500 FIB systems, FEI/Micrion VectraTM 986FC FIB, and Atomika 4500 SIMS, we have "on-site" access to the following complementary analysis equipment and related expertise:
    Philips CM20 Field Emission Transmission / Scanning Transmission Electron Microscope (TEM/STEM)
  • Gatan Imaging Filter (GIF) for Electron Energy Loss Spectroscopy (EELS) and Energy Filtered Imaging
  • Link Energy Dispersive X-ray Spectroscopy (EDX) detector system capable of light element analysis & x-ray mapping
  • Analytical software for phase identification using Convergent Beam Electron Diffraction (CBED) patterns
    • Philips EM400T TEM
  • Gatan Parallel EELS (PEELS)
  • EDAX EDX detector
  • Analytical software for phase identification using Convergent Beam Electron Diffraction (CBED) pattern
    • Philips XL30 Scanning Electron Microscope (SEM)
  • Analysis point-by-point, Line-Scan or Mapping, with standard-based quantification
  • Encoded, computer controlled stage
  • Backscattered Detector
    • Cameca ims4f Magnetic Sector Secondary Ion Mass Spectrometer (SIMS)
  • Cesium (Cs), Oxygen (O) or Argon (Ar) primary ion source
  • Elemental detection from hydrogen (H) to uranium (U), high mass resolving power, often at ppm or ppb detection levels
  • Operation in microprobe or microscope mode Direct Ion Imaging using CCD or RAE systems
    • Cameca SX-50 Electron Probe Microanalyser (EPMA)
  • Wavelength Dispersive X-ray Spectroscopy (WDS) from Carbon (C) to Uranium (U)
  • Analysis Point-by-point, Line-Scan or Mapping, with standard-based quantification
  • Quantification down to tens of ppm in some specimens, better than 0.1 at.% in most
  • Encoded, computer controlled stage
    • Perkin Elmer Phi 5600 X-ray Photoelectron Spectroscopy (XPS) System
  • Provides a direct, non-destructive surface chemical analysis of all elements (except H, He) present at the outermost few atomic layers of solid surfaces (<0.1 monolayer sensitivity or ~ 10-9 g/cm2)
  • Determination of element speciation (chemical forms and oxidation states) at or near the surface of materials
  • Argon ion sputter system to permit depth profiling studies
    • Don't see the instrument you think your analysis requires?
    Fibics maintains an extensive network of partnerships with government and commercial laboratories possessing a wide range of analytical instrumentation. We would be happy to arrange for the use of the correct instrument, either by one of our Fibics' staff, or by the instrument's operator under a strict non-disclosure agreement.
    We can either direct you to the instrument you require, or take care of performing the entire job for you, including a detailed report summarizing the analysis - the choice is yours.
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